[Zurück]


Zeitschriftenartikel:

M. Stöger-Pollach, T. Walter, M. Muske, S. Gall, P. Schattschneider:
"Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchange";
Thin Solid Films, 515 (2007), 7-8; S. 3740 - 3744.



Kurzfassung englisch:
Phase transformations of an alumina membrane and its influence on silicon nucleation during the aluminium induced layer exchange

M. Stöger-Pollach a, T. Walter b, M. Muske c, S. Gall c and P. Schattschneider b

a University Servicecenter for TEM, Technische Universität Wien, Wiedner Hauptstraße 8-10, A-1040 Wien, Austria
b Institute for Solid State Physics, Technische Universität Wien, Wiedner Hauptstraße 8-10, A-1040 Wien, Austria
c Hahn-Meitner-Institut Berlin, Abt. Si-Photovoltaik, Kekuléstraße 5, D-12489 Berlin, Germany

Abstract

The aluminium induced layer exchange process is used for growing crystalline Si films on amorphous substrates like glass, which are further epitaxially thickened and can be used for photovoltaic applications. In this work we investigated Al2O3 membranes separating the Al and Si layer during the layer exchange by means of high-resolution transmission electron microscopy and studied the influence of the membranes' structure on crystallization of Si. We observed a phase transformation of the membrane from the amorphous state to γ-Al2O3 at exchange temperatures at above 450 °C. At higher temperatures this transformations induces cracks into the thin membrane. We further discuss the influence of this phase transformation on the preferential orientation of the growing Si grains.

Schlagworte:
68.37.Lp (TEM/STEM/HRTEM); 68.55.Ac (Nucleation in film growth); 61.50.Ks (Crystallographic aspects of phase transitions)


"Offizielle" elektronische Version der Publikation (entsprechend ihrem Digital Object Identifier - DOI)
http://dx.doi.org/10.1016/j.tsf.2006.09.038

Elektronische Version der Publikation:
http://dx.doi.org/10.1016/j.tsf.2006.09.038


Erstellt aus der Publikationsdatenbank der Technischen Universität Wien.